I recall seeing a video on IC wafer fabrication many years ago, in which the small square dies were broken apart cleanly by scribing, then placing the wafer on a slightly resilient surface (can't recall if they said what it was) and manually rolling a large polished steel cylinder across the back, with some pressure applied. Rolled across once in each of the two directions for fracturing along the scribe lines.
The cylinder was maybe 2 to 3 inches diameter, from memory.
I think the wafer was placed 'component' side down, and presumably the scribe lines were on that side too.
As with glass cutting, the scribe lines would have to be very clean and uniform (ONE stroke, never go back over the line), then the fracturing pressure also has to be very uniform. Or you get a jagged break line. It might be worth making a simple tool something like a wall tile cutter, to scribe the lines in a controlled way.
When you are creating the mask to electroplate your copper electrode lines, can't you mask them to leave copper-free areas where the wafer can be scribed? If you are not using a photo-mask, how do you get those alternating strips?